Atmospheric Plasma vs Low Pressure Plasma - Thierry Corporation

21 Jul.,2025

 

Atmospheric Plasma vs Low Pressure Plasma - Thierry Corporation

Atmospheric plasma and low pressure plasma are the two primary categories that industrial plasma systems would fit into. 

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To understand the primary difference between atmospheric plasma versus low pressure plasma:

The industrial  atmospheric plasma system is designed to ionize a stream of flowing gas and treat a material surface through exposure to the stream of partially ionized gas .

Low pressure plasma requires putting the parts in a vacuum chamber of partially ionized gas to get the surface to be treated in contact with the plasma.  The low pressure plasma system pumps the gas out of the vacuum chamber and replacing the gas with a process gas at a controlled pressure.  This gas is then excited to a plasma state as fresh feed gas is introduced as the vacuum pump continuously removes gas from the process chamber to maintain the process pressure.  

To remove the parts from the vacuum chamber the process gas and power to sustain the plasma reaction are discontinued. The chamber is flushed with gas to remove any gas residue that would cause unfavorable industrial hygiene or be harmful to the operator.  The vacuum pump is then isolated from the vacuum chamber.  Then gas(usually air) is added to the chamber to equalize the pressure in the chamber to room pressure allowing the chamber to be opened and the treated parts removed.

Some of the advantages and disadvantages to consider.

Atmospheric plasma advantages:

Parts are processed continuously, process is performed at room pressure, clean dry compressed air is often the process gas, systems are reliable and have good operational equipment efficiency, tooling can be integrated to a robot for production automation,

Low pressure plasma advantages:

Entire part treated during processing, low takt times easily achievable on large surface area parts, able to achieve high surface energy in materials atmospheric plasma can not, able to provide ultra-clean surface chemistry over other methods,  works well with corrosive service gases, provides operator isolation from process chemistry

Atmospheric plasma disadvantages:

Small area of process during treatment, large volume of gas required to process ( ~cubic meter per hour), takt time for large parts is high,  compatible process gases limited, limited process gas selection, requires ventilation of working area

Low pressure plasma disadvantages:

Parts processed in a batch,  parts processed in a vacuum chamber

Learn About What Vacuum Plasma Is And How It Works

Plasma can be defined as an ionized gas, which is a gas that contains free electrons, free ions, and occasionally free radicals. The plasma state can be produced for industrial application inside vacuum plasma chambers.

In these chambers, the operating pressure is below the atmospheric pressure, for example, vacuum plasma chambers can work at 0.001 bar, which is times less than the atmospheric pressure of 1 bar.

When plasma is created in these conditions, its properties can be exploited for a number of different industrial applications, such as plasma surface modification, plasma polymerization, enhanced surface bonding, plasma etching of electronics, plasma cleaning, and many more.

Plasma technology usage has been growing since the s, and now it is used in many different industries like the semiconductors manufacturing or the automotive industries.

What is a vacuum plasma system?

A vacuum plasma system is an industrial piece of machinery that can produce plasma inside a vacuum plasma chamber. The engineering of the plasma chamber is such that the properties of the generated plasma can be directed to fulfill a specific process requirement.

There are various types of equipment that can produce industrially useful plasma. Additionally, there are numerous different solutions depending on the process and organizational requirements. These solutions can be categorized as Batch Plasma Systems, Inline Plasma Systems, or Strip Plasma Systems.

It is best to consult an expert to properly choose which system is most adapted for one’s application.

How does a vacuum plasma system work?

Vacuum plasma treatments work more or less with the same process steps.

The first step is to introduce the parts to be treated into the plasma chamber. Then the plasma chamber is evacuated from the atmospheric air in the step called pump down. Once the selected vacuum level is reached, a process gas is introduced into the plasma chamber, these gases are typically Argon, Oxygen, or Hydrogen.

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Once the process pressure is stabilized, the process gas is ignited into a plasma.

This plasma can be used, for example, to clean contaminations on the surface of an object if one is seeking plasma cleaning. Other applications may require this plasma treatment to increase surface adhesion or bonding strength.

3 Types of vacuum plasma processes

There are three common types of vacuum plasma processes. See below for a description of each type and how plasma performs the process.

1. Plasma Cleaning

Plasma cleaning in a vacuum plasma system is a process in which unwanted organic contamination is removed from the surface of an object. The plasma can remove the contamination by breaking it down into small molecules that can evaporate from the object’s surface at the given vacuum level. This cleaning process extracts and removes contaminations without leaving any traces.

It is non-toxic, unlike other chemical cleaners, and will even reach areas where other solvents are unable to be used. This is a powerful tool to ensure objects are cleaned entirely of organic contamination.

2. Surface Adhesion & Bonding

The plasma process can be configured to improve adhesion or bonding strength between surfaces that normally have trouble bonding together. This is typically due to the fact that primary or secondary bonds can occur on different materials surfaces only if chemical compatibility is guaranteed.

Plasma can modify the surface only of the materials that need to be bonded, allowing good chemistry to happen between them without impacting the bulk properties of the materials.

In this process, the plasma ions and radicals, being reactive species, will interact with the object's surfaces and chemically modify them.

3. Plasma Polymerization

The objective of plasma polymerization is to produce polymers and direct use them to coat objects inside the vacuum plasma chamber.

During plasma polymerization, a monomer is introduced into the vacuum plasma chamber while the plasma is ignited. This allows the monomer to be activated and be able to react with itself in a self-sustained recursive reaction to produce longer and longer molecules, i.e. polymers.

  • The polymerization happens in a clean and controlled environment

  • The polymer films that are produced will coat evenly oddly shaped substrates thanks to the plasma medium

  • Tuning the plasma parameters can lead to polymer films with different properties (chemical composition, thickness, and surface morphology)

  • The process can be done at low temperatures allowing, therefore, the coating of temperature-sensitive devices

  • The process is a dry process, i.e., it does not use any solvents, reducing the environmental impact of the polymerization process

  • The adhesion between the polymer and the target objects is quite strong as the plasma activation process happens at the same time as the polymerization. This leaves the target object's surface extremely clean and active and ready to bond with the created polymer.

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